New diamond nanofabrication process for hard x-ray zone plates
2011 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 29, no 6, 06FG03-1-06FG03-4 p.Article in journal (Refereed) Published
The authors report on a new tungsten-hardmask-based diamond dry-etch process for fabricating diamond zone plate lenses with a high aspect ratio. The tungsten hardmask is structured by electron-beam lithography, together with Cl2/O2 and SF6/O2 reactive ion etching in a trilayer resist-chromium-tungsten stack. The underlying diamond is then etched in an O2 plasma. The authors demonstrate excellent-quality diamond gratings with half-pitch down to 80 nm and a height of 2.6 μm, as well as zone plates with a 75 μm diameter and 100 nm outermost zone width. The diffraction efficiency of the zone plates is measured to 14.5% at an 8 keV x-ray energy, and the imaging properties were investigated in a scanning microscope arrangement showing sub-100-nm resolution. The imaging and thermal properties of these lenses make them suitable for use with high-brightness x-ray free-electron laser sources.
Place, publisher, year, edition, pages
2011. Vol. 29, no 6, 06FG03-1-06FG03-4 p.
zone plate; reactive ion etching; electron beam lithography; diamond; tungsten; nanofabrication; aspect ratio; x-ray free-electron laser; x-ray optics
IdentifiersURN: urn:nbn:se:kth:diva-47402DOI: 10.1116/1.3656055ISI: 000298538800086ScopusID: 2-s2.0-84255168525OAI: oai:DiVA.org:kth-47402DiVA: diva2:454937
QC 201111142011-11-082011-11-082015-01-12Bibliographically approved