Nanometer-scale flatness and reliability investigation of stress-compensated symmetrically-metallized monocrystalline-silicon multi-layer membranes
2010 (English)In: 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, 2010, 959-962 p.Conference paper (Other academic)
Place, publisher, year, edition, pages
2010. 959-962 p.
Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:kth:diva-48382ScopusID: 2-s2.0-78649271711OAI: oai:DiVA.org:kth-48382DiVA: diva2:457461
5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010. Xiamen. 20 January 2010 - 23 January 2010
QC 201111232011-11-172011-11-172011-11-23Bibliographically approved