Manifold Enhancement of Electron Beam Induced Deposition Rate at Grazing Incidence
2010 (English)In: Nanotechnology, ISSN 0957-4484, E-ISSN 1361-6528, Vol. 21, no 2, 025303- p.Article in journal (Refereed) Published
It is shown how a significant drawback of the electron beam induced deposition technique, namely its low deposition rate, can be circumvented. By tilting a sample, a larger part of the primary electron beam energy becomes dissipated closer to the interface. This in turn increases the emission of secondary electrons, largely responsible for the deposition of the adsorbed molecule components on the surface. An order of magnitude increase in the deposition rate is reported in the fabrication of metal nanowires from organic precursor gas.
Place, publisher, year, edition, pages
Institute of Physics Publishing (IOPP), 2010. Vol. 21, no 2, 025303- p.
EBID, lithography, deposition rate
Accelerator Physics and Instrumentation
IdentifiersURN: urn:nbn:se:kth:diva-48998DOI: 10.1088/0957-4484/21/2/025303ISI: 000272641800008OAI: oai:DiVA.org:kth-48998DiVA: diva2:459113
QC 201111292012-01-272011-11-242012-01-27Bibliographically approved