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Ice-assisted preparation of silica-supported vanadium oxide particles
Fritz Haber Institute. (Chemical Physics)ORCID iD: 0000-0003-1631-4293
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2007 (English)In: The Journal of Physical Chemistry C, ISSN 1932-7447, E-ISSN 1932-7455, Vol. 111, no 14, 5337-5344 p.Article in journal (Refereed) Published
Abstract [en]

Vanadium oxide particles were prepared by physical vapor deposition of vanadium in oxygen ambient onto ice-precovered well-ordered silica thin films. Morphology, electronic structure, and vibrational properties of the vanadia deposits were studied by scanning tunneling microscopy, X-ray photoelectron spectroscopy, temperature-programmed desorption, and infrared reflection absorption spectroscopy. The results show that the ice behaves as an oxidative agent, that favors vanadium oxidation up to V4+, and as a buffer layer that precludes strong interaction of the V adatoms with the silica film. At room temperature, upon desorption of the unreacted water, nanosized particles of vanadia hydroxide-like gel, containing V-OH and, to a lesser extent, vanadyl (VO) species, are formed. Vacuum annealing at 550 K leads to the total dehydration and partial reduction of the particles to V2O3, which expose the V-terminated surface. Subsequent reoxidation in 10(-6) mbar of O-2 irreversibly transforms the surface to the VO terminated, that is, the same as for the reactive deposition onto the clean silica surface. The results suggest that the structure of silica-supported vanadia catalysts is determined by a calcination step and should be considered under low oxygen pressure conditions as vanadium sesquioxide nanoparticles with the VO terminated surface.

Place, publisher, year, edition, pages
2007. Vol. 111, no 14, 5337-5344 p.
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URN: urn:nbn:se:kth:diva-49022DOI: 10.1021/jp0688106ISI: 000245438900010OAI: diva2:461335
QC 20111205Available from: 2011-12-02 Created: 2011-11-24 Last updated: 2011-12-05Bibliographically approved

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Weissenrieder, Jonas
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