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Atomic structure of a thin silica film on a Mo(112) substrate: A combined experimental and theoretical study (vol 73, pg 165414, 2006)
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2006 (English)In: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 73, no 16Article in journal (Refereed) Published
Abstract [en]

The atomic structure of the thin SiO2 film on a Mo(112) substrate has been determined based on a combination of density functional theory calculations and high-quality experimental data obtained from scanning tunneling microscopy, infrared reflection absorption spectroscopy, and x-ray photoelectron spectroscopy. The film consists of a honeycomblike, two-dimensional network of corner-sharing [SiO4] tetrahedra. One oxygen atom of each tetrahedron binds to the Mo(112) substrate and is located in a bridge position between Mo atoms located in rows protruding from the metal surface. The other three oxygen atoms form Si-O-Si bonds with the neighboring tetrahedra.

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2006. Vol. 73, no 16
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URN: urn:nbn:se:kth:diva-50837DOI: 10.1103/PhysRevB.73.249902ISI: 000238696900135OAI: diva2:462857
QC 20111208Available from: 2011-12-08 Created: 2011-12-08 Last updated: 2011-12-09Bibliographically approved

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Weissenrieder, Jonas
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