ALD high-k layer grating couplers for single and double slot on-chip SOI photonics
2011 (English)In: 41st European Solid-State Device Research Conference, ESSDERC 2011, 2011, 191-194 p.Conference paper (Refereed)
State of the art grating couplers for horizontal single and double slot waveguides are presented; in these devices the input signal is transmitted from a single mode optical fiber to silicon on insulator slot waveguides. In the waveguides, atomic layer deposited (ALD) high-k dielectrics form the low refractive index slot. It is demonstrated that the new fully etched design combined with precision of ALD result in highly reproducible devices with efficiency variations less than 1%. Devices have a peak coupling efficiency of 24% at 1.55 μm. In order to achieve the optimal design, optical properties of high-k films are studied with spectroscopic ellipsometry. Measured refractive indices show variations from reference values, originated from film densities.
Place, publisher, year, edition, pages
2011. 191-194 p.
atomic layer deposition, ellipsometry, high-k dielectric thin films, optical fibres, silicon-on-insulator, waveguide couplers, ALD high-k layer grating couplers, atomic layer deposited high-k dielectrics, optical properties, refractive index, silicon on insulator slot waveguides, single mode optical fiber, slot on-chip SOI photonics, slot waveguides, spectroscopic ellipsometry
Other Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:kth:diva-61143DOI: 10.1109/ESSDERC.2011.6044202ScopusID: 2-s2.0-82955195051OAI: oai:DiVA.org:kth-61143DiVA: diva2:478619
41st European Solid-State Device Research Conference, ESSDERC 2011. Helsinki. 12 September 2011 - 16 September 2011
FunderEU, European Research Council
QC 201203062012-01-162012-01-162012-03-06Bibliographically approved