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Sn-background-induced diffusion enhancement of Sb in Si
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1998 (English)In: Physical Review Letters, ISSN 00319007 (ISSN), Vol. 81, no 26, 5856-5859 p.Article in journal (Refereed) Published
Abstract [en]

The diffusion of Sb in Si has been studied as a function of Sn-background concentration, and enhanced Sb diffusion is observed for backgrounds higher than CSn1 = 5 × 1019 cm-3. This concentration for the onset of enhanced diffusion is significantly lower than in other reports of high-concentration vacancy-mediated diffusion in Si. These reports, however, have up to now been concerned with donor impurities, whereas Sn is an electrically neutral impurity. Some Sn precipitation occurred, and the influence upon the diffusion is estimated from experiment to be small. A number of proposed models of high-concentration diffusion are discussed on the basis of the data.

Place, publisher, year, edition, pages
1998. Vol. 81, no 26, 5856-5859 p.
National Category
Condensed Matter Physics
URN: urn:nbn:se:kth:diva-63035OAI: diva2:481544
References: Mathiot, D., Pfister, J.C., (1989) J. Appl. Phys., 66, p. 970; Fair, R.B., Manda, M.L., Wortman, J.J., (1986) J. Mater. Res., 1, p. 705; Nylandsted Larsen, A., Larsen, K.K., Andersen, P.E., (1993) J. Appl. Phys., 73, p. 691; Van Opdorp, C., Van Ijzendoorn, L.J., Fredriksz, C.W., Gravesteijn, D.J., (1992) J. Appl. Phys., 72, p. 4047; Fedotov, S.A., (1994) Phys. Status Solidi (B), 186, p. 375 NR 20140805Available from: 2012-01-21 Created: 2012-01-21 Last updated: 2012-01-21Bibliographically approved

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Linnarsson, M.
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