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A simple and scalable route to wafer-size patterned graphene
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2010 (English)In: Journal of Materials Chemistry, ISSN 0959-9428, E-ISSN 1364-5501, Vol. 20, no 24, 5041-5046 p.Article in journal (Refereed) Published
Abstract [en]

Producing large-scale graphene films with controllable patterns is an essential component of graphene-based nanodevice fabrication. Current methods of graphene pattern preparation involve either high cost, low throughput patterning processes or sophisticated instruments, hindering their large-scale fabrication and practical applications. We report a simple, effective, and reproducible approach for patterning graphene films with controllable feature sizes and shapes. The patterns were generated using a versatile photocoupling chemistry. Features from micrometres to centimetres were fabricated using a conventional photolithography process. This method is simple, general, and applicable to a wide range of substrates including silicon wafers, glass slides, and metal films.

Place, publisher, year, edition, pages
2010. Vol. 20, no 24, 5041-5046 p.
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Chemical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-77355DOI: 10.1039/c0jm00509fISI: 000278757900010OAI: oai:DiVA.org:kth-77355DiVA: diva2:492012
Note
QC 20120221Available from: 2012-02-07 Created: 2012-02-06 Last updated: 2017-12-08Bibliographically approved

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