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Supercritical drying for high aspect-ratio HSQ nano-structures
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2007 (English)In: Microelectronic Engineering, ISSN 0167-9317, E-ISSN 1873-5568, Vol. 84, no 5-8, 1045-1048 p.Article in journal (Refereed) Published
Abstract [en]

The benefits of supercritical resist drying (SRD) technique using carbon dioxide (CO2) are investigated with respect to the resolution of dense patterns and the aspect ratio (AR) of nano-structures in rather thick HSQ layers. For double lines separated by a distance of 50 nm the maximum achievable AR is trebled using SRD processes compared to conventional nitrogen blow. The mechanical stability of resist structures is significantly improved by using SRI).

Place, publisher, year, edition, pages
2007. Vol. 84, no 5-8, 1045-1048 p.
Keyword [en]
supercritical resist drying, SRD, HSQ, electron beam lithography, aspect ratio
National Category
Nano Technology
Identifiers
URN: urn:nbn:se:kth:diva-50541DOI: 10.1016/j.mee.2007.01.142ISI: 000247182500083OAI: oai:DiVA.org:kth-50541DiVA: diva2:495352
Note
QC 2012020301Available from: 2012-02-08 Created: 2011-12-06 Last updated: 2017-12-07Bibliographically approved

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