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High-k-oxide/silicon interfaces characterized by capacitance frequency spectroscopy
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2008 (English)In: Solid-State Electronics, ISSN 0038-1101, E-ISSN 1879-2405, Vol. 52, no 9, 1274-1279 p.Article in journal (Refereed) Published
Abstract [en]

Electron capture into insulator/silicon interface states is investigated for high-k dielectrics of Gd2O3 prepared by molecular beam epitaxy (MBE) and atomic layer deposition (ALD), and for HfO2 prepared by reactive sputtering, by measuring the frequency dependence of Metal Oxide Semiconductor (MOS) capacitance. The capture cross sections are found to be thermally activated and to increase steeply with the energy depth of the interface electron states. The methodology adopted is considered useful for increasing the understanding of high-k-oxide/silicon interfaces.

Place, publisher, year, edition, pages
2008. Vol. 52, no 9, 1274-1279 p.
Keyword [en]
MOS, high-k, HfO2, Gd2O3, capacitance frequency spectroscopy, capture cross section
National Category
Nano Technology
URN: urn:nbn:se:kth:diva-50525DOI: 10.1016/j.sse.2008.04.005ISI: 000259688300003OAI: diva2:495382
QC 20120209Available from: 2012-02-08 Created: 2011-12-06 Last updated: 2012-02-09Bibliographically approved

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Lemme, Max C.
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