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Large scale ultraviolet-based nanoimprint lithography
AMO GmbH, AMICA, Aachen, Germany.
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2003 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 21, no 6, 2760-2764 p.Article in journal (Refereed) Published
Abstract [en]

Limits in resolution and accuracy of large scale ultraviolet (UV)-based nanoimprint lithography using rigid quartz molds and spin coated UV curable resists are presented. The resolution and precision parameters are closely followed from pattern in the mold through imprints in the resist and finally compared with structures transferred into silicon by special etching processes. Specific attention is paid to the simultaneous patterning of nano and microscale structures. The applicability for functional nanoelectronic components is demonstrated by the fabrication of an NMOS transistor based on SOL whose channel width is reduced to 50 nm. (C) 2003 American Vacuum Society.

Place, publisher, year, edition, pages
2003. Vol. 21, no 6, 2760-2764 p.
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Nano Technology
Identifiers
URN: urn:nbn:se:kth:diva-50510DOI: 10.1116/1.1627816ISI: 000188193600087OAI: oai:DiVA.org:kth-50510DiVA: diva2:495397
Note
NR 20140805Available from: 2012-02-08 Created: 2011-12-06 Last updated: 2017-12-07Bibliographically approved

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Lemme, Max C.
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