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Intrinsic and extrinsic corrugation of monolayer graphene deposited on SiO(2)
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2009 (English)In: Physical Review Letters, ISSN 0031-9007, E-ISSN 1079-7114, Vol. 102, no 7, 076102- p.Article in journal (Refereed) Published
Abstract [en]

Using scanning tunneling microscopy in an ultrahigh vacuum and atomic force microscopy, we investigate the corrugation of graphene flakes deposited by exfoliation on a Si/SiO(2) (300 nm) surface. While the corrugation on SiO(2) is long range with a correlation length of about 25 nm, some of the graphene monolayers exhibit an additional corrugation with a preferential wavelength of about 15 nm. A detailed analysis shows that the long-range corrugation of the substrate is also visible on graphene, but with a reduced amplitude, leading to the conclusion that the graphene is partly freely suspended between hills of the substrate. Thus, the intrinsic rippling observed previously on artificially suspended graphene can exist as well, if graphene is deposited on SiO(2).

Place, publisher, year, edition, pages
2009. Vol. 102, no 7, 076102- p.
Keyword [en]
Electron energy levels; Monolayers; Scanning tunneling microscopy; Silicon oxides; Vacuum
National Category
Nano Technology
Identifiers
URN: urn:nbn:se:kth:diva-50508DOI: 10.1103/PhysRevLett.102.076102ISI: 000263599500046OAI: oai:DiVA.org:kth-50508DiVA: diva2:495399
Note
QC 20120209Available from: 2012-02-08 Created: 2011-12-06 Last updated: 2017-12-07Bibliographically approved

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Lemme, Max C.
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