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Electrical properties of the TiSi2-Si transition region in contacts: The influence of an interposed layer of Nb
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2001 (English)In: Journal of Applied Physics, Vol. 90, 2380-2388 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
2001. Vol. 90, 2380-2388 p.
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Other Electrical Engineering, Electronic Engineering, Information Engineering
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URN: urn:nbn:se:kth:diva-80983OAI: oai:DiVA.org:kth-80983DiVA: diva2:497091
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NR 20140805Available from: 2012-02-10 Created: 2012-02-10 Last updated: 2012-02-10Bibliographically approved

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Hellberg, P.-E.

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