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Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks
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2010 (English)In: Optics Express, ISSN 1094-4087, E-ISSN 1094-4087, Vol. 18, no 14, 14467-14473 p.Article in journal (Refereed) Published
Abstract [en]

We have realized the first demonstration of a table-top aerial imaging microscope capable of characterizing pattern and defect printability in extreme ultraviolet lithography masks. The microscope combines the output of a 13.2 nm wavelength, table-top, plasma-based, EUV laser with zone plate optics to mimic the imaging conditions of an EUV lithographic stepper. We have characterized the illumination of the system and performed line-edge roughness measurements on an EUVL mask. The results open a path for the development of a compact aerial imaging microscope for high-volume manufacturing.

Place, publisher, year, edition, pages
Optical Society of America, 2010. Vol. 18, no 14, 14467-14473 p.
National Category
Atom and Molecular Physics and Optics
Identifiers
URN: urn:nbn:se:kth:diva-85955DOI: 10.1364/OE.18.014842ISI: 000279639900017PubMedID: 20639931OAI: oai:DiVA.org:kth-85955DiVA: diva2:500291
Note
QC 20120220Available from: 2012-02-13 Created: 2012-02-13 Last updated: 2017-12-07Bibliographically approved

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