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Interferometric lithography with an amplitude division interferometer and a desktop extreme ultraviolet laser
Department of Electrical and Computer Engineering, Colarado State University.
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2008 (English)In: Journal of the Optical Society of America. B, Optical physics, ISSN 0740-3224, E-ISSN 1520-8540, Vol. 25, no 7, B104-B107 p.Article in journal (Refereed) Published
Abstract [en]

We demonstrate a compact interferometric lithography nanopatterning tool based on an amplitude division interferometer (ADI) and a 46.9 nm wavelength desktop size capillary discharge laser. The system is designed to print arrays of lines, holes, and dots with sizes below 100 nm on high resolution photoresists for the fabrication of arrays of nanostructures with physical and biological applications. The future combination of this ADI with high repetition rate tabletop lasers operating at shorter wavelengths should allow the printing of arrays of sub-10 nm size features with a tabletop setup.

Place, publisher, year, edition, pages
Optical Society of America, 2008. Vol. 25, no 7, B104-B107 p.
Keyword [en]
UV, EUV, and X-ray lasers ; Nanostructure fabrication
National Category
Atom and Molecular Physics and Optics
Identifiers
URN: urn:nbn:se:kth:diva-86022DOI: 10.1364/JOSAB.25.00B104ISI: 000258014000016OAI: oai:DiVA.org:kth-86022DiVA: diva2:500339
Note
QC 20120214Available from: 2012-02-13 Created: 2012-02-13 Last updated: 2017-12-07Bibliographically approved

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Publisher's full texthttp://josab.osa.org/abstract.cfm?URI=josab-25-7-B104

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Martz, Dale
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