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High spatial resolution full-field microscopy using a desktop-size soft x-ray laser
NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University.
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2007 (English)In: Proceedings of SPIE: The International Society for Optical Engineering, 2007, Vol. 6702Conference paper, Published paper (Refereed)
Abstract [en]

Images with nanoscale resolution were obtained in both transmission and reflection modes using a full-field microscope that is illuminated by an extremely compact λ = 46.9 nm (hv = 26.4 eV) soft x-ray laser. The microscope was used to image the surface of partially processed silicon semiconductor chips containing periodic patterns of polysilicon and metal lines. To characterize the microscope, modulation transfer functions were experimentally built for three different objective zone plates, and images with near-wavelength resolution were obtained.

Place, publisher, year, edition, pages
2007. Vol. 6702
Series
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE), ISSN 0277-786X
Keyword [en]
Imaging, Microscopy, Soft x-ray laser, Zone plates
National Category
Biological Sciences Other Engineering and Technologies
Identifiers
URN: urn:nbn:se:kth:diva-86190DOI: 10.1117/12.733422ISI: 000252167400018OAI: oai:DiVA.org:kth-86190DiVA: diva2:500470
Conference
SOFT X-RAY LASERS AND APPLICATIONS VII
Note
Conference on Soft X-Ray Lasers and Applications VII, San Diego, CA, AUG 29-30, 2007. QC 20120306Available from: 2012-02-13 Created: 2012-02-13 Last updated: 2012-08-22Bibliographically approved

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