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High resolution full-field imaging of nanostructures using compact extreme ultraviolet lasers
NSF Engineering Research Center for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University.
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2009 (English)In: 9TH INTERNATIONAL CONFERENCE ON X-RAY MICROSCOPY / [ed] David, C; Nolting, F; Quitmann, C; Stampanoni, M; Pfeiffer, F, 2009, Vol. 186Conference paper (Refereed)
Abstract [en]

Recent advances in the development of high peak brightness table-top extreme ultraviolet (EUV) and soft x-ray (SRX) lasers have opened new opportunities for the demonstration of compact full-field EUV/SXR microscopes capable of capturing images with short exposures down to a single laser shot. We demonstrate the practical application of table-top zone plate EUV microscopes that can image nanostructures with a spatial resolution of 54 nm and below and exposure times as short as 1.2 ns, the duration of a single laser shot.

Place, publisher, year, edition, pages
2009. Vol. 186
, Journal of Physics Conference Series, ISSN 1742-6588 ; 186
National Category
Other Engineering and Technologies
URN: urn:nbn:se:kth:diva-86185DOI: 10.1088/1742-6596/186/1/012026ISI: 000282023900026OAI: diva2:500500
9th International Conference on X-Ray Microscopy. ETH, Zurich, SWITZERLAND. JUL 21-25, 2008
QC 20120220Available from: 2012-02-13 Created: 2012-02-13 Last updated: 2012-02-20Bibliographically approved

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Martz, Dale
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