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Table-top Extreme Ultraviolet Laser Aerial Imaging of Lithographic Masks
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2010 (English)In: 2010 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (QELS), 2010Conference paper, Published paper (Refereed)
Abstract [en]

We report the first at-wavelength line edge roughness measurements of patterned EUV lithography masks realized using a table-top aerial imaging system based on a table-top lambda=13.2 laser.

Place, publisher, year, edition, pages
2010.
National Category
Other Engineering and Technologies
Identifiers
URN: urn:nbn:se:kth:diva-86182ISI: 000290513600005ISBN: 978-1-55752-890-2 (print)OAI: oai:DiVA.org:kth-86182DiVA: diva2:500505
Conference
Conference on Lasers and Electro-Optics (CLEO)/Quantum Electronics and Laser Science Conference (QELS). San Jose, CA. MAY 16-21, 2010
Note
QC 20120220Available from: 2012-02-13 Created: 2012-02-13 Last updated: 2012-02-20Bibliographically approved

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CiteExportLink to record
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  • apa
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  • ieee
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