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Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks
NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University.
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2010 (English)In: 2010 23RD ANNUAL MEETING OF THE IEEE PHOTONICS SOCIETY, 2010, 584-585 p.Conference paper, Published paper (Refereed)
Abstract [en]

We have developed a compact aerial full-field microscope based on a table-top 13.2 nmwavelength extreme ultraviolet laser and diffractive optics to characterize the printing performance of EUV lithographic masks.

Place, publisher, year, edition, pages
2010. 584-585 p.
Keyword [en]
At-wavelength characterization, Extreme ultraviolet lasers, Extreme ultraviolet lithography masks, Full-field, Lithographic mask, Printing performance, Table-top
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Other Engineering and Technologies
Identifiers
URN: urn:nbn:se:kth:diva-86180DOI: 10.1109/PHOTONICS.2010.5699022Scopus ID: 2-s2.0-79951890715OAI: oai:DiVA.org:kth-86180DiVA: diva2:500508
Conference
2010 23RD ANNUAL MEETING OF THE IEEE PHOTONICS SOCIETY
Note
23rd Annual Meeting of the IEEE Photonics-Society, Denver, CO, NOV 07-11, 2010. QC 20120215Available from: 2012-02-13 Created: 2012-02-13 Last updated: 2012-02-15Bibliographically approved

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