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Optimization of Active Vibration Control of a Laser Pattern Generator in Micro Lithography
Micronic Laser Systems AB, Sweden .
KTH, School of Industrial Engineering and Management (ITM), Machine Design (Dept.), Mechatronics.
KTH, School of Industrial Engineering and Management (ITM), Machine Design (Dept.), Mechatronics.
2010 (English)In: Proceedings of the 10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010, euspen , 2010, Vol. 1, 491-494 p.Conference paper, Published paper (Refereed)
Abstract [en]

The extreme precision requirements in semiconductor manufacturing drive the need for an active vibration isolation system in a laser pattern generator. Optimization has been performed and evaluated in a model using a high level programming tool [1]. The areas of optimization were 1) Decoupling strategies for decentralized control and 2) Improved feed forward control. Only a limited description of the model itself is given here. More about the model is presented in [2] and [3].

Place, publisher, year, edition, pages
euspen , 2010. Vol. 1, 491-494 p.
Keyword [en]
Precision engineering, Semiconductor device manufacture, Semiconductor lasers, Active vibration controls, Active vibration isolation systems, High-level programming, Laser pattern generator, Semiconductor manufacturing
National Category
Other Mechanical Engineering
Identifiers
URN: urn:nbn:se:kth:diva-91386Scopus ID: 2-s2.0-84911428079ISBN: 978-095530828-4 (print)OAI: oai:DiVA.org:kth-91386DiVA: diva2:509795
Conference
10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010, Delft, Netherlands, 31 May 2010 through 4 June 2010
Note

QC 20120321

Available from: 2012-03-21 Created: 2012-03-14 Last updated: 2015-04-22Bibliographically approved

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Optimization vibr ctrl v7(94 kB)145 downloads
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CiteExportLink to record
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Citation style
  • apa
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  • de-DE
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