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3D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si Etching
KTH, School of Electrical Engineering (EES), Microsystem Technology (Changed name 20121201).ORCID iD: 0000-0003-3452-6361
KTH, School of Electrical Engineering (EES), Microsystem Technology (Changed name 20121201).ORCID iD: 0000-0001-9008-8402
KTH, School of Industrial Engineering and Management (ITM), Materials Science and Engineering, Applied Material Physics.ORCID iD: 0000-0003-4889-4210
KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.ORCID iD: 0000-0001-6459-749X
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2012 (English)Conference paper, Published paper (Other academic)
Place, publisher, year, edition, pages
2012.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:kth:diva-91425OAI: oai:DiVA.org:kth-91425DiVA: diva2:510024
Conference
The 56th International Conference on Electron, Ion, Photon Beam Technolog (EIPBN)
Note

QC 20121210

Available from: 2012-03-14 Created: 2012-03-14 Last updated: 2016-12-22Bibliographically approved

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Fischer, Andreas C.Gylfason, Kristinn B.Malm, Gunnar B.Stemme, GöranNiklaus, Frank

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Fischer, Andreas C.Gylfason, Kristinn B.Belova, Liubov M.Malm, Gunnar B.Kolahdouz, MohammadrezaStemme, GöranNiklaus, Frank
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Microsystem Technology (Changed name 20121201)Applied Material PhysicsIntegrated Devices and Circuits
Engineering and Technology

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