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Growth of GaSb1-xBix by molecular beam epitaxy
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2012 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 30, no 2, 02B114- p.Article in journal (Refereed) Published
Abstract [en]

Molecular beam epitaxy for GaSb1-xBix is investigated in this article. The growth window for incorporation of Bi in GaSb was found. Strategies of avoiding formation of Bi droplets and enhancing Bi incorporation were studied. The Bi incorporation was confirmed by SIMS and RBS measurements. The Bi concentration in the samples was found to increase with increasing growth temperature and Bi flux. The position of GaSb1-xBix layer peak in XRD rocking curves is found to be correlated to Bi composition. Surface and structural properties of the samples were also investigated. Samples grown on GaSb and GaAs substrates were compared and no apparent difference for Bi incorporation was found.

Place, publisher, year, edition, pages
2012. Vol. 30, no 2, 02B114- p.
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:kth:diva-94064DOI: 10.1116/1.3672025ISI: 000302219500014Scopus ID: 2-s2.0-84861624315OAI: oai:DiVA.org:kth-94064DiVA: diva2:525603
Funder
Swedish Research Council
Note
QC 20120508Available from: 2012-05-08 Created: 2012-05-07 Last updated: 2017-12-07Bibliographically approved

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Hallén, Anders

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