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A strategy for increased carbon ionization in magnetron sputtering discharges
KTH, School of Electrical Engineering (EES), Space and Plasma Physics.
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2012 (English)In: Diamond and related materials, ISSN 0925-9635, Vol. 23, 1-4 p.Article in journal (Refereed) Published
Abstract [en]

A strategy that facilitates a substantial increase of carbon ionization in magnetron sputtering discharges is presented in this work. The strategy is based on increasing the electron temperature in a high power impulse magnetron sputtering discharge by using Ne as the sputtering gas. This allows for the generation of an energetic C+ ion population and a substantial increase in the C+ ion flux as compared to a conventional Ar-HiPIMS process. A direct consequence of the ionization enhancement is demonstrated by an increase in the mass density of the grown films up to 2.8 g/cm(3); the density values achieved are substantially higher than those obtained from conventional magnetron sputtering methods.

Place, publisher, year, edition, pages
2012. Vol. 23, 1-4 p.
Keyword [en]
HiPIMS, HPPMS, Carbon ionization, Tetrahedral amorphous carbon, Diamond-like carbon
National Category
Fusion, Plasma and Space Physics
URN: urn:nbn:se:kth:diva-95122DOI: 10.1016/j.diamond.2011.12.043ISI: 000302887600001ScopusID: 2-s2.0-84856204275OAI: diva2:526798
Swedish Research Council, 621-2008-3222 623-2009-7348
QC 20120515Available from: 2012-05-15 Created: 2012-05-14 Last updated: 2012-05-15Bibliographically approved

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