A strategy for increased carbon ionization in magnetron sputtering discharges
2012 (English)In: Diamond and related materials, ISSN 0925-9635, Vol. 23, 1-4 p.Article in journal (Refereed) Published
A strategy that facilitates a substantial increase of carbon ionization in magnetron sputtering discharges is presented in this work. The strategy is based on increasing the electron temperature in a high power impulse magnetron sputtering discharge by using Ne as the sputtering gas. This allows for the generation of an energetic C+ ion population and a substantial increase in the C+ ion flux as compared to a conventional Ar-HiPIMS process. A direct consequence of the ionization enhancement is demonstrated by an increase in the mass density of the grown films up to 2.8 g/cm(3); the density values achieved are substantially higher than those obtained from conventional magnetron sputtering methods.
Place, publisher, year, edition, pages
2012. Vol. 23, 1-4 p.
HiPIMS, HPPMS, Carbon ionization, Tetrahedral amorphous carbon, Diamond-like carbon
Fusion, Plasma and Space Physics
IdentifiersURN: urn:nbn:se:kth:diva-95122DOI: 10.1016/j.diamond.2011.12.043ISI: 000302887600001ScopusID: 2-s2.0-84856204275OAI: oai:DiVA.org:kth-95122DiVA: diva2:526798
FunderSwedish Research Council, 621-2008-3222 623-2009-7348
QC 201205152012-05-152012-05-142012-05-15Bibliographically approved