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On the stability of the flow in multi-channel electrochemical systems
KTH, School of Chemical Science and Engineering (CHE), Chemical Engineering and Technology, Applied Electrochemistry.
KTH, School of Chemical Science and Engineering (CHE), Chemical Engineering and Technology, Applied Electrochemistry.ORCID iD: 0000-0001-5816-2924
2012 (English)In: Journal of Applied Electrochemistry, ISSN 0021-891X, E-ISSN 1572-8838, Vol. 42, no 9, 679-687 p.Article in journal (Refereed) Published
Abstract [en]

The importance of the fluid dynamics in the modelling of electrochemical systems is often underestimated. The knowledge of the flow velocity pattern in an electrochemical cell, in fact, can allow us to associate certain electrochemical reactions with specific fluid patterns to maximize the yield of some reaction and, conversely, to minimize unwanted or side reactions. The correct evaluation of the convective term in the Nernst-Planck equation, however, requires the solution of the so-called Navier-Stokes equations, and computational fluid dynamics (CFD) is today the established method to numerically solve these equations. In this work, a CFD model is employed to show that the gas-liquid flow pattern can be remarkably different in a single channel or in a multi-channel gas-evolving electrochemical system. In the single channel, in fact, under certain conditions, vortices and recirculation regions can appear in the flow, which does not appear in the multi-channel case. The reason of this difference is found in the uneven distribution of the small bubbles in the two cases. Additionally, a second, simplified, model of the flow is discussed to show how a higher concentration of small bubbles in the single channel system can destabilize the flow.

Place, publisher, year, edition, pages
2012. Vol. 42, no 9, 679-687 p.
Keyword [en]
Chlorate cells, Computational fluid dynamics, Pseudo turbulence, Flow stability
National Category
Chemical Engineering
Identifiers
URN: urn:nbn:se:kth:diva-103145DOI: 10.1007/s10800-012-0426-0ISI: 000308441300005Scopus ID: 2-s2.0-84867102123OAI: oai:DiVA.org:kth-103145DiVA: diva2:559397
Note

QC 20121009

Available from: 2012-10-09 Created: 2012-10-04 Last updated: 2017-12-07Bibliographically approved

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