Black silicon with controllable macropore array for enhanced photoelectrochemical performance
2012 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 101, no 11, 111901- p.Article in journal (Refereed) Published
Macroporous silicon with multiscale texture for reflection suppression and light trapping was achieved through a controllable electrochemical etching process. It was coated with TiO2 by atomic layer deposition, and used as the photoanode in photocatalytic water splitting. A conformal pn-junction was also built-in in order to split water without external bias. A 45% enhancement in photocurrent density was observed after black silicon etching. In comparison with nano-structured silicon, the etching process here has neither metal contamination nor requirement of vacuum facilities.
Place, publisher, year, edition, pages
2012. Vol. 101, no 11, 111901- p.
Atomic Layer Deposition, Solar-Cells, Water, Electrodes, Nanowires
IdentifiersURN: urn:nbn:se:kth:diva-106153DOI: 10.1063/1.4752231ISI: 000309329300022ScopusID: 2-s2.0-84866342487OAI: oai:DiVA.org:kth-106153DiVA: diva2:572941
QC 201211292012-11-292012-11-292013-11-19Bibliographically approved