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Black silicon with controllable macropore array for enhanced photoelectrochemical performance
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2012 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 101, no 11, 111901- p.Article in journal (Refereed) Published
Abstract [en]

Macroporous silicon with multiscale texture for reflection suppression and light trapping was achieved through a controllable electrochemical etching process. It was coated with TiO2 by atomic layer deposition, and used as the photoanode in photocatalytic water splitting. A conformal pn-junction was also built-in in order to split water without external bias. A 45% enhancement in photocurrent density was observed after black silicon etching. In comparison with nano-structured silicon, the etching process here has neither metal contamination nor requirement of vacuum facilities.

Place, publisher, year, edition, pages
2012. Vol. 101, no 11, 111901- p.
Keyword [en]
Atomic Layer Deposition, Solar-Cells, Water, Electrodes, Nanowires
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-106153DOI: 10.1063/1.4752231ISI: 000309329300022Scopus ID: 2-s2.0-84866342487OAI: oai:DiVA.org:kth-106153DiVA: diva2:572941
Note

QC 20121129

Available from: 2012-11-29 Created: 2012-11-29 Last updated: 2017-12-07Bibliographically approved

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He, Sailing

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Electromagnetic EngineeringZhejiang-KTH Joint Research Center of Photonics, JORCEP
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