Plasmonic analog of microstrip transmission line and effect of thermal annealing on its propagation loss
2013 (English)In: Optics Express, ISSN 1094-4087, Vol. 21, no 2, 1639-1644 p.Article in journal (Refereed) Published
We fabricated a plasmonic analog of the microwave microstrip transmission line and measured its propagation loss before and after thermal annealing. It is found that its propagation loss at 980 nm wavelength can be reduced by more than 50%, from 0.45 to 0.20 dB/μm, after thermal annealing at 300 °C. The reduction in loss can be attributed to the improved gold surface condition and probably also to the change in the metal's inner structure. Less evident loss reduction is noticed at 1550 nm, which is owing to extremely small portion of the modal electric field located in the metal regions at this wavelength.
Place, publisher, year, edition, pages
2013. Vol. 21, no 2, 1639-1644 p.
Annealing, Electric fields, Microstrip lines, Plasmons
Atom and Molecular Physics and Optics
IdentifiersURN: urn:nbn:se:kth:diva-116128DOI: 10.1364/OE.21.001639ISI: 000315989500032ScopusID: 2-s2.0-84874076489OAI: oai:DiVA.org:kth-116128DiVA: diva2:588768
FunderSwedish Foundation for Strategic Research Swedish Research Council
QC 201303202013-01-152013-01-152014-02-03Bibliographically approved