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A novel pulsed high-density plasma process for nanoparticle synthesis
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2012 (English)In: Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012, 2012, 368-370 p.Conference paper (Refereed)
Abstract [en]

This work presents a new technique to produce nanoparticles in a controlled manor using highly ionized plasmas that will ionize the source material [1]. The advantage of ionizing the source material is that it will increase the trapping onto negatively charged nanoparticles (NPs) that should result in a significant increase in productivity. In this work we have performed both simulations and experiments. The experiments were performed using high power impulses to generate high plasma densities. The dense plasma yields a high degree of ionization of the sputtered metal species. Solid metal cylinders of Cu, Ag, Ti and Mo were used as hollow cathodes for the synthesis of NPs. By tuning the process parameters, pulsing energy, pulsing frequency, etc., the particle size can range from of 5 nm to 700 nm in diameter.

Place, publisher, year, edition, pages
2012. 368-370 p.
Keyword [en]
Hollow cathode, Nanoparticle, Plasma, Pulsed power, Sputtering
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URN: urn:nbn:se:kth:diva-117177ScopusID: 2-s2.0-84865003859ISBN: 978-146656274-5OAI: diva2:601659
Nanotechnology 2012: Advanced Materials, CNTs, Particles, Films and Composites - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012, 18 June 2012 through 21 June 2012, Santa Clara, CA

QC 20130130

Available from: 2013-01-30 Created: 2013-01-30 Last updated: 2013-01-30Bibliographically approved

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Brenning, Nils
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Space and Plasma Physics
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