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Size-controlled growth of nanoparticles in a highly ionized pulsed plasma
KTH, School of Electrical Engineering (EES), Space and Plasma Physics.
2013 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 102, no 3, 033108- p.Article in journal (Refereed) Published
Abstract [en]

Copper nanoparticles (NPs) were synthesized using a high power pulsed hollow cathode technique and the produced NPs were studied as a function of pulse parameters, i.e., frequency, peak current, and pulse width. It was found that the particle size can be altered in a range from 10 to 40 nm by changing any one of the pulse parameters. The mechanisms of NP synthesis with respect to a pulsed discharge and a high degree of ionization of the sputtered material are discussed.

Place, publisher, year, edition, pages
2013. Vol. 102, no 3, 033108- p.
Keyword [en]
Sputtering System, Magnetron, Particles, Cluster, Energy
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Other Physics Topics
Identifiers
URN: urn:nbn:se:kth:diva-118611DOI: 10.1063/1.4788739ISI: 000314032600072Scopus ID: 2-s2.0-84872940039OAI: oai:DiVA.org:kth-118611DiVA: diva2:607181
Funder
Swedish Research Council, 349-2008-6582
Note

QC 20130222

Available from: 2013-02-22 Created: 2013-02-21 Last updated: 2017-12-06Bibliographically approved

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