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Interface engineering of Ge using thulium oxide: Band line-up study
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2013 (English)In: Microelectronic Engineering, ISSN 0167-9317, E-ISSN 1873-5568, Vol. 109, 204-207 p.Article in journal (Refereed) Published
Abstract [en]

This paper investigates the band line-up and optical properties (dielectric function) of Tm2O3/Ge gate stacks deposited by atomic layer deposition. X-ray photoelectron spectroscopy has been performed to ascertain the shallow core levels (Ge3d and Tm4d) in ultra-thin and bulk Tm2O3/Ge stacks as well as valence band maxima in Ge and bulk Tm2O3. The valence band offset of Tm2O3/Ge has been found to be 2.95 +/- 0.08 eV. Vacuum ultra violet variable angle spectroscopic ellipsometry studies reveal the indirect band gap nature of Tm2O3, with the value extracted from the Tauc method of 5.3 +/- 0.1 eV. A distinct absorption feature is observed at similar to 3.2 eV below the band gap of Tm2O3, and clearly distinguished from the Si and Ge critical points. A dielectric constant of 14 to 15 has been derived from the electrical measurements on 5 nm Tm2O3/epi Ge/Si gate stacks. The band line-up study of Tm2O3/Ge implies an acceptable barrier for holes (2.95 eV) and electrons (greater than 1.7 eV) for Ge MOSFET engineering.

Place, publisher, year, edition, pages
Elsevier, 2013. Vol. 109, 204-207 p.
Keyword [en]
Thulium oxide, Valence band offset, Band gap
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:kth:diva-125541DOI: 10.1016/j.mee.2013.03.160ISI: 000321229200054Scopus ID: 2-s2.0-84876697515OAI: oai:DiVA.org:kth-125541DiVA: diva2:640257
Note

QC 20130813

Available from: 2013-08-13 Created: 2013-08-09 Last updated: 2017-12-06Bibliographically approved

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Dentoni Litta, EugenioHellström, Per-Erik

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Henkel, ChristophDentoni Litta, EugenioHellström, Per-ErikÖstling, Mikael
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Integrated Devices and Circuits
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