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Full characterization of a focused wavefield with sub 100 nm resolution
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2013 (English)In: Advances In X-Ray Free-Electron Lasers II: Instrumentation, SPIE - International Society for Optical Engineering, 2013, 87780G- p.Conference paper (Refereed)
Abstract [en]

A hard x-ray free-electron laser (XFEL) provides an x-ray source with an extraordinary high peak-brilliance, a time structure with extremely short pulses and with a large degree of coherence, opening the door to new scientific fields. Many XFEL experiments require the x-ray beam to be focused to nanometer dimensions or, at least, benefit from such a focused beam. A detailed knowledge about the illuminating beam helps to interpret the measurements or is even inevitable to make full use of the focused beam. In this paper we report on focusing an XFEL beam to a transverse size of 125nm and how we applied ptychographic imaging to measure the complex wavefield in the focal plane in terms of phase and amplitude. Propagating the wavefield back and forth we are able to reconstruct the full caustic of the beam, revealing aberrations of the nano-focusing optic. By this method we not only obtain the averaged illumination but also the wavefield of individual XFEL pulses.

Place, publisher, year, edition, pages
SPIE - International Society for Optical Engineering, 2013. 87780G- p.
, Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X ; 8778
Keyword [en]
Compound refractive lenses, Free-electron lasers, Imaging and sensing, Ptychography, Xrays
National Category
Engineering and Technology
URN: urn:nbn:se:kth:diva-134056DOI: 10.1117/12.2020856ISI: 000323547400006ScopusID: 2-s2.0-84880705432ISBN: 978-081949580-8OAI: diva2:664938
Advances in X-Ray Free-Electron Lasers II: Instrumentation; Prague; Czech Republic; 17 April 2013 through 18 April 2013

QC 20131118

Available from: 2013-11-18 Created: 2013-11-15 Last updated: 2013-11-18Bibliographically approved

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Nilsson, DanielUhlén, FredrikVogt, UlrichHertz, Hans M.
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