Modeling the extraction of sputtered metal from high power impulse hollow cathode discharges
2013 (English)In: Plasma sources science & technology (Print), ISSN 0963-0252, E-ISSN 1361-6595, Vol. 22, no 3, 035006- p.Article in journal (Refereed) Published
High power impulse hollow cathode sputtering is studied as a means to produce high fluxes of neutral and ionized sputtered metal species. A model is constructed for the understanding and optimization of such discharges. It relates input parameters such as the geometry of the cathode, the electric pulse form and frequency, and the feed gas flow rate and pressure, to the production, ionization, temperature and extraction of the sputtered species. Examples of processes that can be quantified by the use of the model are the internal production of sputtered metal and the degree of its ionization, the speed and efficiency of out-puffing from the hollow cathode associated with the pulses, and the gas back-flow into the hollow cathode between pulses. The use of the model is exemplified with a special case where the aim is the synthesis of nanoparticles in an expansion volume that lies outside the hollow cathode itself. The goals are here a maximum extraction efficiency, and a high degree of ionization of the sputtered metal. It is demonstrated that it is possible to reach a degree of ionization above 85%, and extraction efficiencies of 3% and 17% for the neutral and ionized sputtered components, respectively.
Place, publisher, year, edition, pages
2013. Vol. 22, no 3, 035006- p.
Degree of ionization, Electric pulse, Expansion volumes, Extraction efficiencies, Hollow cathode discharge, Hollow cathodes, Input parameter, Sputtered species
Other Physics Topics
IdentifiersURN: urn:nbn:se:kth:diva-134289DOI: 10.1088/0963-0252/22/3/035006ISI: 000319820100010ScopusID: 2-s2.0-84878828912OAI: oai:DiVA.org:kth-134289DiVA: diva2:665730
FunderEU, European Research CouncilSwedish Research Council, 2008-6572
QC 201311202013-11-202013-11-202013-11-20Bibliographically approved