Change search
ReferencesLink to record
Permanent link

Direct link
Plasma reactivity in high-power impulse magnetron sputtering through oxygen kinetics
KTH, School of Electrical Engineering (EES), Space and Plasma Physics.ORCID iD: 0000-0001-8591-1003
KTH, School of Electrical Engineering (EES), Space and Plasma Physics.
2013 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 103, no 10Article in journal (Refereed) Published
Abstract [en]

The atomic oxygen metastable dynamics in a Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS) discharge has been characterized using time-resolved diode laser absorption in an Ar/O-2 gas mixture with a Ti target. Two plasma regions are identified: the ionization region (IR) close to the target and further out the diffusion region (DR), separated by a transition region. The ls temporal resolution allows identifying the main atomic oxygen production and destruction routes, which are found to be very different during the pulse as compared to the afterglow as deduced from their evolution in space and time.

Place, publisher, year, edition, pages
2013. Vol. 103, no 10
Keyword [en]
Electron-Impact, Deposition, Hysteresis, Atoms
National Category
Physical Sciences
URN: urn:nbn:se:kth:diva-134754DOI: 10.1063/1.4819835ISI: 000324389700072ScopusID: 2-s2.0-84884271920OAI: diva2:668196
Swedish Research Council

QC 20131129

Available from: 2013-11-29 Created: 2013-11-28 Last updated: 2013-12-06Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full textScopus

Search in DiVA

By author/editor
Lundin, DanielBrenning, Nils
By organisation
Space and Plasma Physics
In the same journal
Applied Physics Letters
Physical Sciences

Search outside of DiVA

GoogleGoogle Scholar
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

Altmetric score

Total: 43 hits
ReferencesLink to record
Permanent link

Direct link