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Plasma reactivity in high-power impulse magnetron sputtering through oxygen kinetics
KTH, School of Electrical Engineering (EES), Space and Plasma Physics.ORCID iD: 0000-0001-8591-1003
KTH, School of Electrical Engineering (EES), Space and Plasma Physics.
2013 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 103, no 10Article in journal (Refereed) Published
Abstract [en]

The atomic oxygen metastable dynamics in a Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS) discharge has been characterized using time-resolved diode laser absorption in an Ar/O-2 gas mixture with a Ti target. Two plasma regions are identified: the ionization region (IR) close to the target and further out the diffusion region (DR), separated by a transition region. The ls temporal resolution allows identifying the main atomic oxygen production and destruction routes, which are found to be very different during the pulse as compared to the afterglow as deduced from their evolution in space and time.

Place, publisher, year, edition, pages
2013. Vol. 103, no 10
Keyword [en]
Electron-Impact, Deposition, Hysteresis, Atoms
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-134754DOI: 10.1063/1.4819835ISI: 000324389700072Scopus ID: 2-s2.0-84884271920OAI: oai:DiVA.org:kth-134754DiVA: diva2:668196
Funder
Swedish Research Council
Note

QC 20131129

Available from: 2013-11-29 Created: 2013-11-28 Last updated: 2017-12-06Bibliographically approved

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Lundin, Daniel

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