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Fast growth of nanoparticles in a hollow cathode plasma through orbit motion limited ion collection
Plasma and Coatings Physics Division, Linköping University.
Plasma and Coatings Physics Division, Linköping University.
Dept of Electrical Engineering and Electronics, Univ. of Liverpool.
KTH, School of Electrical Engineering (EES), Space and Plasma Physics.
2013 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 103, no 19, 193108- p.Article in journal (Refereed) Published
Abstract [en]

Plasma-based nanoparticle synthesis techniques are attractive in many respects but suffer from a major drawback-low productivity. We demonstrate a technique by which the growth rate of copper nanoparticles has been substantially increased by collection of copper ions. A growth rate as high as 470 nm/s was obtained as compared to a growth rate of less than 3 nm/s in the case of growth by neutrals. The increased trapping of copper is explained as orbital motion limited (OML) collection of ions. Experimentally obtained nanoparticle growth rates are in good agreement with theoretical estimates of the OML ion collection rates.

Place, publisher, year, edition, pages
2013. Vol. 103, no 19, 193108- p.
Keyword [en]
Copper ions, Copper nanoparticles, Fast growths, Hollow cathodes, Ion collection, Nanoparticle growths, Nanoparticle synthesis, Orbital motion limiteds
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Other Physics Topics
URN: urn:nbn:se:kth:diva-137308DOI: 10.1063/1.4828883ISI: 000327817000067ScopusID: 2-s2.0-84889838266OAI: diva2:678685
Knut and Alice Wallenberg Foundation, 2012.0083Swedish Research Council, 2008-6572Strategic Initiative - Materials Science, 2009 00971

QC 20140113

Available from: 2013-12-12 Created: 2013-12-12 Last updated: 2014-01-13Bibliographically approved

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Brenning, Nils
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