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Monolayer Study by VSFS: In Situ Response to Compression and Shear in a Contact
KTH, School of Chemical Science and Engineering (CHE), Chemistry, Surface and Corrosion Science.
KTH, School of Chemical Science and Engineering (CHE), Chemistry, Surface and Corrosion Science.
KTH, School of Chemical Science and Engineering (CHE), Chemistry, Surface and Corrosion Science.
KTH, School of Chemical Science and Engineering (CHE), Chemistry, Surface and Corrosion Science.
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2014 (English)In: Langmuir, ISSN 0743-7463, E-ISSN 1520-5827, Vol. 30, no 11, 3075-3085 p.Article in journal (Refereed) Published
Abstract [en]

Self-assembled octadecyltrichlorosilane ((OTS), CH3(CH2)(17)SiCl3) layers on hydroxyl-terminated silicon oxide (SiO2) were prepared. The monolayers were characterized with atomic force microscopy (AFM) and contact angle measurements; their conformation was studied before, during, and after contact with a polymer (either PDMS or PTFE) surface using the vibrational sum frequency spectroscopy (VSFS) technique. During contact, the effect of pressure was studied for both polymer surfaces, but in the case of PTFE, the effect of shear rate on the contact was simultaneously studied. The VSFS response of the monolayers with pressure was almost entirely due to changes in the real area of contact with the polymer and therefore the Fresnel factors, whereas sliding caused disorder in the previously all-trans monolayer, as evidenced by a significant increase in the population of gauche defects.

Place, publisher, year, edition, pages
2014. Vol. 30, no 11, 3075-3085 p.
Keyword [en]
Atomic force microscopy, Monolayers, Polymers, Silicon oxides
National Category
Chemical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-144944DOI: 10.1021/la4042474ISI: 000333539000014Scopus ID: 2-s2.0-84897094136OAI: oai:DiVA.org:kth-144944DiVA: diva2:715483
Funder
Swedish Research CouncilSwedish Foundation for Strategic Research
Note

QC 20140505

Available from: 2014-05-05 Created: 2014-05-05 Last updated: 2017-12-05Bibliographically approved

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Ghalgaoui, AhmedShimizu, RyosukeHosseinpour, SamanAlvarez-Asencio, RubénMcKee, ClaytonJohnson, C. MagnusRutland, Mark W.
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