Efficient proximity effect correction method based on multivariate adaptive regression splines for grayscale e-beam lithography
2014 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 32, no 3, 031602- p.Article in journal (Refereed) Published
Grayscale electron beam lithography is an important technique to manufacture three-dimensional (3D) micro- and nano-structures, such as diffractive optical devices and Fresnel lenses. However, the proximity effect due to the scattering of electrons may cause significant error to the desired 3D structure. Conventional proximity correction methods depend on the exposure energy distribution which sometimes is difficult to obtain. In this study, the authors develop a novel proximity effect correction method based on multivariate adaptive regression splines, which takes exposure energy and development into consideration simultaneously. To evaluate the method, a Fresnel lens was fabricated through simulation and experiment. The measurements demonstrate the feasibility and validity of the method.
Place, publisher, year, edition, pages
2014. Vol. 32, no 3, 031602- p.
Electrical Engineering, Electronic Engineering, Information Engineering Physical Sciences
IdentifiersURN: urn:nbn:se:kth:diva-147744DOI: 10.1116/1.4875955ISI: 000337061900046ScopusID: 2-s2.0-84900822144OAI: oai:DiVA.org:kth-147744DiVA: diva2:732497
QC 201407042014-07-042014-07-032014-07-04Bibliographically approved