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Efficient proximity effect correction method based on multivariate adaptive regression splines for grayscale e-beam lithography
KTH, School of Engineering Sciences (SCI), Physics, Physics of Medical Imaging.
KTH, School of Engineering Sciences (SCI), Physics, Physics of Medical Imaging.ORCID iD: 0000-0002-7725-0548
2014 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 32, no 3, 031602- p.Article in journal (Refereed) Published
Abstract [en]

Grayscale electron beam lithography is an important technique to manufacture three-dimensional (3D) micro- and nano-structures, such as diffractive optical devices and Fresnel lenses. However, the proximity effect due to the scattering of electrons may cause significant error to the desired 3D structure. Conventional proximity correction methods depend on the exposure energy distribution which sometimes is difficult to obtain. In this study, the authors develop a novel proximity effect correction method based on multivariate adaptive regression splines, which takes exposure energy and development into consideration simultaneously. To evaluate the method, a Fresnel lens was fabricated through simulation and experiment. The measurements demonstrate the feasibility and validity of the method.

Place, publisher, year, edition, pages
2014. Vol. 32, no 3, 031602- p.
National Category
Electrical Engineering, Electronic Engineering, Information Engineering Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-147744DOI: 10.1116/1.4875955ISI: 000337061900046Scopus ID: 2-s2.0-84900822144OAI: oai:DiVA.org:kth-147744DiVA: diva2:732497
Note

QC 20140704

Available from: 2014-07-04 Created: 2014-07-03 Last updated: 2017-12-05Bibliographically approved

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Nillius, Peter

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