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Effect of local curvature on the interaction between hydrophobic surfaces
KTH, School of Chemical Science and Engineering (CHE), Chemistry, Surface and Corrosion Science.
KTH, School of Chemical Science and Engineering (CHE), Chemistry, Surface and Corrosion Science. YKI, Institute for Surface Chemistry, Stockholm, Sweden .
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2010 (English)In: Nanotechnology 2010: Advanced Materials, CNTs, Particles, Films and Composites - Technical Proceedings of the 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010: Volume 1, 2010, 61-64 p.Conference paper, Published paper (Refereed)
Abstract [en]

Surface structure, including roughness and chemical heterogeneities, is known to be of importance for the surface interaction forces observed between hydrophobic and superhydrophobic surfaces. In this study, silica particles have been used to prepare structured particulated surfaces with a controlled roughness using Langmuir-Blodgett deposition or a drop coating technique. The surfaces were characterized by SEM and AFM. The AFM colloidal probe technique was employed for probing the interaction between a micro-size hydrophobic particle and hydrophobic surfaces with a sintered and silanized nano-sized silica particle monolayer. These measurements indicate that the adhesion force is increased by a decrease in particle size. Larger roughness gives larger crevices on the surface and more air/vapor accumulation but the capillary growth is impaired since the three-phase line (solid-liquid-air) has to move over a longer distance with an increase in the size of the surface features.

Place, publisher, year, edition, pages
2010. 61-64 p.
Keyword [en]
AFM, Capillary force, Hydrophobic interaction, Surface forces, Surface roughness
National Category
Nano Technology
Identifiers
URN: urn:nbn:se:kth:diva-149713Scopus ID: 2-s2.0-78049446328ISBN: 978-143983401-5 (print)OAI: oai:DiVA.org:kth-149713DiVA: diva2:741181
Conference
Nanotechnology 2010: Advanced Materials, CNTs, Particles, Films and Composites - 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010, 21 June 2010 through 24 June 2010, Anaheim, CA, United States
Note

QC 20140827

Available from: 2014-08-27 Created: 2014-08-26 Last updated: 2014-08-27Bibliographically approved

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CiteExportLink to record
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Citation style
  • apa
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