3D fabrication of waveguide and grating coupler in SU-8 by optimized gray scale electron beam lithography
2010 (English)In: 2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010, 2010, 542-543 p.Conference paper (Refereed)
Gray scale electron beam lithography is optimized for simple and accurate prototyping of 3D waveguides and grating output couplers in SU-8. Gratings with complex profiles and free of lag effect can be realized with this technique.
Place, publisher, year, edition, pages
2010. 542-543 p.
3D fabrication, Complex profiles, Grating couplers, Gray scale, Lag effects, Output couplers, Prototyping, Electron beam lithography, Electron beams, Optimization, Three dimensional, Waveguides, Photonics
Other Physics Topics
IdentifiersURN: urn:nbn:se:kth:diva-150028DOI: 10.1109/ACP.2010.5682619ScopusID: 2-s2.0-79851470828ISBN: 978-142447111-9OAI: oai:DiVA.org:kth-150028DiVA: diva2:742245
Asia Communications and Photonics Conference and Exhibition, ACP 2010, 8 December 2010 through 12 December 2010, Shanghai, China
QC 201409012014-09-012014-08-292014-09-01Bibliographically approved