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Molecularly selective nanopatterns using nanoimprint lithography: A label-free sensor architecture
KTH, School of Engineering Sciences (SCI), Applied Physics, Nanostructure Physics. Division of Solid State Physics and the Nanometer Structure Consortium, Lund University, Sweden .ORCID iD: 0000-0003-0675-974X
2011 (English)In: Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, ISSN 2166-2746, E-ISSN 2166-2754, Vol. 29, no 1, 0110212-0110215 p.Article in journal (Refereed) Published
Abstract [en]

Nanoimprint lithography (NIL) can generate well defined nanostructures with high efficiency and at very low cost. Molecular imprinting (MIP) is a "bottom-up" technique creating a polymer layer exhibiting structures with a molecular selectivity. Such polymer structures may be employed as molecular recognition sites for sensing applications. In this work, the authors combine NIL with MIP and they are able to obtain micro- and nanopatterns of polymer with features down to 100 nm that show high molecular selectivity.

Place, publisher, year, edition, pages
AVS Science and Technology Society , 2011. Vol. 29, no 1, 0110212-0110215 p.
Keyword [en]
High efficiency, Label-free sensors, Low costs, Molecular imprinting, Molecular selectivity, Nano pattern, Polymer layers, Polymer structure, Sensing applications, Molecular biology, Molecular recognition, Polymers, Nanoimprint lithography
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-151441DOI: 10.1116/1.3527080ISI: 000286679400024Scopus ID: 2-s2.0-79551616356OAI: oai:DiVA.org:kth-151441DiVA: diva2:748730
Note

QC 20140922

Available from: 2014-09-22 Created: 2014-09-22 Last updated: 2017-12-05Bibliographically approved

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Forchheimer, Daniel

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