Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology
2008 (English)In: 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS, 2008, 148-149 p.Conference paper (Refereed)
Silicon nanowire waveguides and related etched diffraction grating (EDG) demultiplexers are studied by α-Si-on-SiO2 technology. Compact EDG demultiplexers with 10 run spacing for both echelle and total-internal- reflection (TIR) facets have been fabricated and characterized.
Place, publisher, year, edition, pages
2008. 148-149 p.
, 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
Composite micromechanics, Diffraction, Diffraction gratings, Electric discharge machining, MEMS, Microelectromechanical devices, Nanostructured materials, Nanostructures, Nanowires, Photonics, Powders, Silicon, Silicon compounds, Demultiplexers, Etched diffraction gratings, Si nanowires, Silicon nanowires, Demultiplexing
Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:kth:diva-154312DOI: 10.1109/OMEMS.2008.4607872ISI: 000264556700075ScopusID: 2-s2.0-54049140619ISBN: 9781424419180OAI: oai:DiVA.org:kth-154312DiVA: diva2:757079
2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS, 11 August 2008 through 14 August 2008, Freiburg
QC 201410212014-10-212014-10-172014-10-21Bibliographically approved