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Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology
KTH, School of Electrical Engineering (EES), Electromagnetic Engineering.
KTH, School of Electrical Engineering (EES), Electromagnetic Engineering.
2008 (English)In: 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS, 2008, 148-149 p.Conference paper, Published paper (Refereed)
Abstract [en]

Silicon nanowire waveguides and related etched diffraction grating (EDG) demultiplexers are studied by α-Si-on-SiO2 technology. Compact EDG demultiplexers with 10 run spacing for both echelle and total-internal- reflection (TIR) facets have been fabricated and characterized.

Place, publisher, year, edition, pages
2008. 148-149 p.
Series
2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
Keyword [en]
Composite micromechanics, Diffraction, Diffraction gratings, Electric discharge machining, MEMS, Microelectromechanical devices, Nanostructured materials, Nanostructures, Nanowires, Photonics, Powders, Silicon, Silicon compounds, Demultiplexers, Etched diffraction gratings, Si nanowires, Silicon nanowires, Demultiplexing
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:kth:diva-154312DOI: 10.1109/OMEMS.2008.4607872ISI: 000264556700075Scopus ID: 2-s2.0-54049140619ISBN: 9781424419180 (print)OAI: oai:DiVA.org:kth-154312DiVA: diva2:757079
Conference
2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS, 11 August 2008 through 14 August 2008, Freiburg
Note

QC 20141021

Available from: 2014-10-21 Created: 2014-10-17 Last updated: 2014-10-21Bibliographically approved

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CiteExportLink to record
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  • apa
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Language
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  • nn-NO
  • nn-NB
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  • Other locale
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Output format
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