Effect of substrate roughness on the magnetic properties of thin fcc Co films
2007 (English)In: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 76, no 5, 054429- p.Article in journal (Refereed) Published
We present a study of the influence of substrate roughness on the magnetic properties of thin fcc Co films (7 and 17 nm thick) grown on Cu(001)/Si(001). A significant decrease in cubic anisotropy with increasing film roughness was observed with Brillouin light scattering and magneto-optical Kerr effect magnetometry. In addition, the rougher samples showed a substantial broadening of the spin wave peaks. Both effects were found to be more pronounced for the thinner Co layers. Our observations are discussed in the framework of a theoretical model which takes into account the morphology of the Co films as measured by atomic force microscopy. While roughness effects are usually discussed in the context of Néel's "orange-peel" model, we propose a qualitatively different effect in this work whereby the magnetization follows coherently the substrate morphology ("undulating" state) resulting in the absence of magnetic surface charges. This magnetic configuration gives rise to a reduction in the magnetic anisotropy of epitaxial thin films, which is in good qualitative agreement with the experimental observations.
Place, publisher, year, edition, pages
2007. Vol. 76, no 5, 054429- p.
IdentifiersURN: urn:nbn:se:kth:diva-155597DOI: 10.1103/PhysRevB.76.054429ISI: 000249155100100ScopusID: 2-s2.0-34548014775OAI: oai:DiVA.org:kth-155597DiVA: diva2:762042
QC 201411102014-11-102014-11-072014-11-10Bibliographically approved