Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Effect of substrate roughness on the magnetic properties of thin fcc Co films
KTH, School of Industrial Engineering and Management (ITM), Materials Science and Engineering. University of Cambridge, United Kingdom .ORCID iD: 0000-0003-2170-0076
Show others and affiliations
2007 (English)In: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 76, no 5, 054429- p.Article in journal (Refereed) Published
Abstract [en]

We present a study of the influence of substrate roughness on the magnetic properties of thin fcc Co films (7 and 17 nm thick) grown on Cu(001)/Si(001). A significant decrease in cubic anisotropy with increasing film roughness was observed with Brillouin light scattering and magneto-optical Kerr effect magnetometry. In addition, the rougher samples showed a substantial broadening of the spin wave peaks. Both effects were found to be more pronounced for the thinner Co layers. Our observations are discussed in the framework of a theoretical model which takes into account the morphology of the Co films as measured by atomic force microscopy. While roughness effects are usually discussed in the context of Néel's "orange-peel" model, we propose a qualitatively different effect in this work whereby the magnetization follows coherently the substrate morphology ("undulating" state) resulting in the absence of magnetic surface charges. This magnetic configuration gives rise to a reduction in the magnetic anisotropy of epitaxial thin films, which is in good qualitative agreement with the experimental observations.

Place, publisher, year, edition, pages
2007. Vol. 76, no 5, 054429- p.
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-155597DOI: 10.1103/PhysRevB.76.054429ISI: 000249155100100Scopus ID: 2-s2.0-34548014775OAI: oai:DiVA.org:kth-155597DiVA: diva2:762042
Note

QC 20141110

Available from: 2014-11-10 Created: 2014-11-07 Last updated: 2017-12-05Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full textScopus

Authority records BETA

Ström, Valter

Search in DiVA

By author/editor
Ström, Valter
By organisation
Materials Science and Engineering
In the same journal
Physical Review B. Condensed Matter and Materials Physics
Physical Sciences

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 18 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf