Influence of substrate roughness on the magnetic properties of thin fcc Co films
2007 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 101, no 9, 09D113- p.Article in journal (Refereed) Published
We present a study of the influence of substrate roughness on the magnetic properties of thin fcc Co films (7 and 17 nm thick) grown on Cu (001) Si (001). A significant decrease in cubic anisotropy with increasing film roughness was observed with Brillouin light scattering. In addition, the rougher samples exhibited a substantial broadening of the spin wave peaks. Both effects were found to be more pronounced for the thinner Co layers. We propose a magnetic configuration with the magnetization following coherently the substrate morphology ("undulating" state) resulting in the absence of magnetic surface charges. This configuration gives rise to a reduction in the magnetic anisotropy of epitaxial thin films, in good qualitative agreement with the experimental observations.
Place, publisher, year, edition, pages
2007. Vol. 101, no 9, 09D113- p.
Brillouin scattering, Cobalt compounds, Magnetic anisotropy, Magnetization, Substrates, Surface roughness
Other Physics Topics
IdentifiersURN: urn:nbn:se:kth:diva-155630DOI: 10.1063/1.2711611ISI: 000246567900184ScopusID: 2-s2.0-34248578502OAI: oai:DiVA.org:kth-155630DiVA: diva2:764226
10th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference, January 07-11, 2007, Baltimore, MD
QC 201411182014-11-182014-11-072014-11-18Bibliographically approved