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Influence of substrate roughness on the magnetic properties of thin fcc Co films
KTH, School of Industrial Engineering and Management (ITM), Materials Science and Engineering. University of Cambridge, United Kingdom.ORCID iD: 0000-0003-2170-0076
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2007 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 101, no 9, 09D113- p.Article in journal (Refereed) Published
Abstract [en]

We present a study of the influence of substrate roughness on the magnetic properties of thin fcc Co films (7 and 17 nm thick) grown on Cu (001) Si (001). A significant decrease in cubic anisotropy with increasing film roughness was observed with Brillouin light scattering. In addition, the rougher samples exhibited a substantial broadening of the spin wave peaks. Both effects were found to be more pronounced for the thinner Co layers. We propose a magnetic configuration with the magnetization following coherently the substrate morphology ("undulating" state) resulting in the absence of magnetic surface charges. This configuration gives rise to a reduction in the magnetic anisotropy of epitaxial thin films, in good qualitative agreement with the experimental observations.

Place, publisher, year, edition, pages
2007. Vol. 101, no 9, 09D113- p.
Keyword [en]
Brillouin scattering, Cobalt compounds, Magnetic anisotropy, Magnetization, Substrates, Surface roughness
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URN: urn:nbn:se:kth:diva-155630DOI: 10.1063/1.2711611ISI: 000246567900184ScopusID: 2-s2.0-34248578502OAI: diva2:764226
10th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference, January 07-11, 2007, Baltimore, MD

QC 20141118

Available from: 2014-11-18 Created: 2014-11-07 Last updated: 2014-11-18Bibliographically approved

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