Design and fabrication of ultrasmall arrayed waveguide grating multiplexers based on Si nanowire waveguides
2007 (English)In: Optoelectronics Letters, ISSN 1673-1905, Vol. 3, no 1, 7-9 p.Article in journal (Refereed) Published
The large refractive index difference between Si and SiO2 makes it possible to realize ultrasmall photonic integrated circuits. A 5 × 5 ultracompact arrayed waveguide grating multiplexer based on 500×250 nm Si nanowire waveguides is designed and fabricated by using the technologies of E-beam writing and amorphous-Si deposition. The measured channel spacing is about 1.5 nm (close to the design value) and the channel crosstalk is about -8 dB.
Place, publisher, year, edition, pages
2007. Vol. 3, no 1, 7-9 p.
Other Physics Topics
IdentifiersURN: urn:nbn:se:kth:diva-155666DOI: 10.1007/s11801-007-6139-7ScopusID: 2-s2.0-34547165550OAI: oai:DiVA.org:kth-155666DiVA: diva2:764349
QC 201411192014-11-192014-11-072014-11-19Bibliographically approved