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Design and fabrication of ultrasmall arrayed waveguide grating multiplexers based on Si nanowire waveguides
KTH, School of Information and Communication Technology (ICT), Microelectronics and Information Technology, IMIT. KTH, School of Information and Communication Technology (ICT), Centres, Zhejiang-KTH Joint Research Center of Photonics, JORCEP.
KTH, School of Electrical Engineering (EES), Electromagnetic Engineering. KTH, School of Information and Communication Technology (ICT), Centres, Zhejiang-KTH Joint Research Center of Photonics, JORCEP.
2007 (English)In: Optoelectronics Letters, ISSN 1673-1905, Vol. 3, no 1, 7-9 p.Article in journal (Refereed) Published
Abstract [en]

The large refractive index difference between Si and SiO2 makes it possible to realize ultrasmall photonic integrated circuits. A 5 × 5 ultracompact arrayed waveguide grating multiplexer based on 500×250 nm Si nanowire waveguides is designed and fabricated by using the technologies of E-beam writing and amorphous-Si deposition. The measured channel spacing is about 1.5 nm (close to the design value) and the channel crosstalk is about -8 dB.

Place, publisher, year, edition, pages
2007. Vol. 3, no 1, 7-9 p.
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URN: urn:nbn:se:kth:diva-155666DOI: 10.1007/s11801-007-6139-7Scopus ID: 2-s2.0-34547165550OAI: oai:DiVA.org:kth-155666DiVA: diva2:764349
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QC 20141119

Available from: 2014-11-19 Created: 2014-11-07 Last updated: 2014-11-19Bibliographically approved

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