Toward a New Appropriability Regime : the case of Chinese ICT industry
2012 (English)Report (Other academic)
This paper aims to provide extension and qualification to an empirical peculiarity - the duality of Chinese IPR management practices – discussed in an earlier paper (Long & Palmberg, 2006 “navigating IPR thickets from a latecomer perspective”). The duality refers that the emerging multinational firms from for example China and India are rapidly catching up, innovating and patenting on the one hand, and heavily relying on other means rather than patents, to appropriate returns on the other. In the light of recent developments of Chinese patenting - the quantitative data in WIPO, USPTO and SIPO - this paper also adds updated interview data with firms and policy makers to search for interpretation.
Four updates can be highlighted from this study. While there is a continued rapid upsurge in Chinese patenting – on applications as well as on granted ones – the patent data also shows a deeper movement toward the technology cores, as well as an increasing indigenous-ness in patenting. Together it implies that a Chinese ICT upgrading has taken place. Whereas the duality embraced two groups of emerging actors varying in size, technological knowledge base and market target (international/domestic), today it is a conscious approach by the very same firm, to respond to challenges of rapid technical changes and multifaceted competitions from both inside China and the world outside.
Place, publisher, year, edition, pages
KTH Royal Institute of Technology, 2012.
TRITA-IEO, ISSN 1100-7982 ; 2012:02
Appropriability, Technology innovation, IPRs (Intellectual Property Rights), Catching up
Research subject Industrial Engineering and Management; Industrial Engineering and Management
IdentifiersURN: urn:nbn:se:kth:diva-158481ISRN: KTH/IEO/R-12:02-SEISBN: 978-91-7501-281-0OAI: oai:DiVA.org:kth-158481DiVA: diva2:777013
QC 201501212015-01-082015-01-082015-01-21Bibliographically approved