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Design and performance of a new reactor for vapor phase epitaxy of 3C, 6H, and 4H SiC
1996 (English)In: Journal of the Electrochemical Society, ISSN 0013-4651, E-ISSN 1945-7111, Vol. 143, no 9, 2910-2919 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1996. Vol. 143, no 9, 2910-2919 p.
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Engineering and Technology
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URN: urn:nbn:se:kth:diva-161321DOI: 10.1149/1.1837126ISI: A1996VH20900049OAI: oai:DiVA.org:kth-161321DiVA: diva2:794698
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NR 20150402

Available from: 2015-03-12 Created: 2015-03-11 Last updated: 2017-12-04Bibliographically approved

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Nordell, N

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