Reduction of multimode effects in an SOI-based etched diffraction grating demultiplexer
2005 (English)In: Optics Communications, ISSN 0030-4018, E-ISSN 1873-0310, Vol. 247, no 4-6, 281-290 p.Article in journal (Refereed) Published
Multimode effects in the free propagation region (FPR) of a silicon-on-insulator (SOI)-based etched diffraction grating (EDG) demultiplexer are analyzed. In a conventional design, the power coupled to the higher order modes is considerable, which introduces a significant excess loss and crosstalk. It is shown that the multimode effects in an SOI EDG demultiplexer are much more detrimental than in an arrayed waveguide grating demultiplexer. Several methods for reducing the multimode effects are discussed. In particular, a laterally tapered structure between the FPR and the input/output waveguides is proposed as a simple and effective method for reducing the power coupled to the higher order modes and consequently reducing the multimode effects. The taper width is optimized to minimize the crosstalk.
Place, publisher, year, edition, pages
2005. Vol. 247, no 4-6, 281-290 p.
multimode effect, taper, silicon-on-insulator, etched diffraction grating, insertion loss, crosstalk, demultiplexer
Other Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:kth:diva-5159DOI: 10.1016/j.optcom.2004.11.080ISI: 000228112800006OAI: oai:DiVA.org:kth-5159DiVA: diva2:7961
QC 201009282005-05-272005-05-272013-11-19Bibliographically approved