Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Exponentially decaying magnetic coupling in sputtered thin film FeNi/Cu/FeCo trilayers
Show others and affiliations
2015 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 106, no 4, 042405Article in journal (Refereed) Published
Abstract [en]

Magnetic coupling in trilayer films of FeNi/Cu/FeCo deposited on Si/SiO2 substrates have been studied. While the thicknesses of the FeNi and FeCo layers were kept constant at 100 angstrom, the thickness of the Cu spacer was varied from 5 to 50 angstrom. Both hysteresis loop and ferromagnetic resonance results indicate that all films are ferromagnetically coupled. Micromagnetic simulations well reproduce the ferromagnetic resonance mode positions measured by experiments, enabling the extraction of the coupling constants. Films with a thin Cu spacer are found to be strongly coupled, with an effective coupling constant of 3 erg/cm(2) for the sample with a 5 angstrom Cu spacer. The strong coupling strength is qualitatively understood within the framework of a combined effect of Ruderman-Kittel-Kasuya-Yosida and pinhole coupling, which is evidenced by transmission electron microscopy analysis. The magnetic coupling constant surprisingly decreases exponentially with increasing Cu spacer thickness, without showing an oscillatory thickness dependence. This is partially connected to the substantial interfacial roughness that washes away the oscillation. The results have implications on the design of multilayers for spintronic applications.

Place, publisher, year, edition, pages
2015. Vol. 106, no 4, 042405
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-161130DOI: 10.1063/1.4906591ISI: 000348996200043Scopus ID: 2-s2.0-84923779171OAI: oai:DiVA.org:kth-161130DiVA: diva2:796740
Funder
Swedish Research CouncilKnut and Alice Wallenberg FoundationSwedish Foundation for Strategic Research
Note

QC 20150320

Available from: 2015-03-20 Created: 2015-03-09 Last updated: 2017-12-04Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full textScopus

Search in DiVA

By author/editor
Åkerman, Johan
By organisation
Material Physics, MF
In the same journal
Applied Physics Letters
Physical Sciences

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 35 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf