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Improvement of the Thermal Stability of Nickel Stanogermanide by Carbon Pre-Stanogermanidation Implant into GeSn Substrate
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2015 (English)In: ECS Journal of Solid State Science and Technology, ISSN 2162-8769, E-ISSN 2162-8777, Vol. 4, no 3, P67-P70 p.Article in journal (Refereed) Published
Abstract [en]

An effective method to improve the thermal stability of Ni(Ge1-xSnx) by carbon pre-stanogermanidation implant into GeSn substrate is investigated systematically. As-prepared samples were characterized by means of sheet resistance measurement, X-ray diffraction (XRD), scanning electron microscopy (SEM), cross-sectional transmission electron microscopy (X-TEM) and secondary ions mass spectroscopy (SIMS). The incorporation of carbon leads to significantly improved thermal stability of Ni(Ge1-xSnx) by about 100 degrees C as well as tends to change the preferred orientations of polycrystalline Ni(Ge1-xSnx). The robust thermal stability can be attributed to the segregation of C in grain boundaries and at Ni(Ge1-xSnx)/GeSn interface after stanogermanidation.

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2015. Vol. 4, no 3, P67-P70 p.
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Materials Engineering
URN: urn:nbn:se:kth:diva-161631DOI: 10.1149/2.0041503jssISI: 000349549700008ScopusID: 2-s2.0-84923340198OAI: diva2:797637

QC 20150324

Available from: 2015-03-24 Created: 2015-03-13 Last updated: 2015-03-24Bibliographically approved

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Radamson, Henry
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Integrated Devices and Circuits
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