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Ultra-hard AlMgB14 Coatings Fabricated by RF Magnetron Sputtering from a Stoichiometric Target
KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.
KTH, School of Information and Communication Technology (ICT), Integrated Devices and Circuits.ORCID iD: 0000-0001-8774-9302
2015 (English)In: JETP Letters: Journal of Experimental And Theoretical Physics Letters, ISSN 0021-3640, E-ISSN 1090-6487, Vol. 100, no 10, 680-687 p.Article in journal (Refereed) Published
Abstract [en]

For the first time hard aluminum magnesium boride films were fabricated by RF magnetron sputtering from a single stoichiometric ceramic AlMgB14 target. Optimized processing conditions (substrate temperature, target sputtering power and target-to-substrate distance) enable fabrication of stoichiometric in-depth compositionally homogeneous films with the peak values of nanohardness 88 GPa and Young's modulus 517 GPa at the penetration depth of 26 nm and, respectively, 35 and 275 GPa at 200 nm depth in 2 mu m thick film.

Place, publisher, year, edition, pages
2015. Vol. 100, no 10, 680-687 p.
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Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-162974DOI: 10.1134/S0021364014220056ISI: 000350022900016Scopus ID: 2-s2.0-84923079794OAI: oai:DiVA.org:kth-162974DiVA: diva2:799624
Note

QC 20150331

Available from: 2015-03-31 Created: 2015-03-26 Last updated: 2017-12-04Bibliographically approved

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Khartsev, S. I.

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