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Dry Patch Formation in Diabatic Annular Two-Phase Flows
KTH, School of Engineering Sciences (SCI), Physics, Reactor Technology.ORCID iD: 0000-0001-5595-1952
2014 (English)In: Journal of Power Technologies, ISSN 2083-4187, E-ISSN 2083-4195, Vol. 94, 85-95 p.Article in journal (Refereed) Published
Abstract [en]

Conditions for the formation of a stable dry patch in vertical annular two-phase flows in heated channels are investigated. An analytical model of the force balance for the leading edge of the liquid film is developed. In addition to surface tension, evaporation thrust and capillary forces, the model includes the effect of turbulence, the pressure gradient and the interfacial shear stress. Numerical evaluations are performed to validate the model and to indicate the importance of various factors on the dry patch stability and on the resulting minimum wetting rate of the liquid film. The analyses indicate that good agreement with measurements is obtained in case of stagnant patch formed on liquid film flowing down a vertical surface. It is shown that for low and moderate mass flow rate of the gas phase in vertical co-current annular flow, the force balance is dominated by the stagnation and the shear stress forces. With growing mass flow rate of the gas phase, the pressure gradient and the interfacial shear stress are increasingly important. As a result, in accordance with measurements, the predicted minimum flow rate of the liquid film at which the patch is re-wetted decreases.

Place, publisher, year, edition, pages
2014. Vol. 94, 85-95 p.
Keyword [en]
Dryout, Annular flow, Minimum Wetting Rate, Liquid Film
National Category
Energy Engineering
URN: urn:nbn:se:kth:diva-163565OAI: diva2:801121

QC 20150410

Available from: 2015-04-08 Created: 2015-04-08 Last updated: 2015-04-10Bibliographically approved

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