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Gray scale E-beam lithography to fabricate 3D microsized waveguide and grating coupler in SU-8
KTH, School of Information and Communication Technology (ICT).
KTH, School of Information and Communication Technology (ICT).
KTH, School of Information and Communication Technology (ICT).
KTH, School of Information and Communication Technology (ICT). Aalto University, Finland.
2010 (English)In: Frontiers in Optics, 2010Conference paper, Published paper (Refereed)
Abstract [en]

Gray scale electron beam lithography is applied to prototype 3D waveguides and grating output couplers in SU-8 with simple and accurate method. The lag effect in reactive ion etching of Silicon-on-insulator gratings is avoided here.

Place, publisher, year, edition, pages
2010.
Series
Optics InfoBase Conference Papers, ISSN 2162-2701
Keyword [en]
e-Beam lithography, Grating couplers, Gray scale, Gray scale electron beam lithographies, Lag effects, Output couplers
National Category
Other Physics Topics
Identifiers
URN: urn:nbn:se:kth:diva-165016Scopus ID: 2-s2.0-84896776444OAI: oai:DiVA.org:kth-165016DiVA: diva2:807262
Conference
Laser Science, LS 2010, Rochester, NY, United States, 24 October 2010 through 28 October 2010
Note

QC 20150423

Available from: 2015-04-23 Created: 2015-04-21 Last updated: 2015-04-23Bibliographically approved

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CiteExportLink to record
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